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Nanoparticle reduction in Cu CMP for 20nm node and beyond
by
Jeanjean, Damien
,
Robin, Olivier
,
Sramek, Rurh
,
Mermoz, Sebastien
,
Ducotey, Gregoire
,
Gaillard, Sebastien
,
Yufei Chen
,
Pitard, Frederic
,
Nicoud, Laurent
,
Brown, Brian
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Chemical Mechanical Cleaning
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Cleaning
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Cmp Process
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Copper
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Defect Control
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Metals
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Microstructures
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Nanoparticle Detection
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Reduction
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