Search Results - Steinhäusler, Thomas

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  1. 1
    A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist

    A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist by Lin, Qinghuang, Steinhäusler, Thomas, Simpson, Logan, Wilder, Michelle, Medeiros, David R, Willson, C. Grant, Havard, Jennifer, Fréchet, Jean M. J

    Published in Chemistry of materials
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  2. 2
    Advances in Resist Materials for 193 nm Lithography

    Advances in Resist Materials for 193 nm Lithography by Bowden, Murrae J., Gabor, Allen H., Dimov, Ognian, Medina, Arturo N., Foster, Patrick, Steinhäusler, Thomas, Biafore, John J., Spaziano, Gregory, Slater, Sydney G., Blakeney, Andrew J., Neisser, Mark O., Houlihan, Frank M., Cirelli, Ray A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L., Sweeney, James R., Timko, Allen G., Nalamasu, Om, Reichmanis, Elsa

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  3. 3
    Gas permeation and sorption studies on stereoregular polynorbornene

    Gas permeation and sorption studies on stereoregular polynorbornene by Steinhäusler, Thomas, Koros, William J.

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  4. 4
    Ring opening metathesis polymerization of methyl- N-(1-phenylethyl)-2-azabicyclo[2.2.1]hept-5-ene-3-carboxylate

    Ring opening metathesis polymerization of methyl- N-(1-phenylethyl)-2-azabicyclo[2.2.1]hept-5-ene-3-carboxylate by Schitter, Regina M.E, Steinhäusler, Thomas, Stelzer, Franz

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  5. 5
    Optically active polymers via ring-opening metathesis polymerization: 2. Polymerization of enantiomerically pure ( ± )- endo-2-norbornenyl acetate

    Optically active polymers via ring-opening metathesis polymerization: 2. Polymerization of enantiomerically pure ( ± )- endo-2-norbornenyl acetate by Steinhäusler, Thomas, Stelzer, Franz

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  6. 6
    Optically active polymers via ring-opening metathesis polymerization: 1. Polymers from enantiomerically pure 2-acyloxybicyclo[2.2.1]hept-5-enes

    Optically active polymers via ring-opening metathesis polymerization: 1. Polymers from enantiomerically pure 2-acyloxybicyclo[2.2.1]hept-5-enes by Steinhäusler, Thomas, Stelzer, Franz, Zenkl, Ernst

    Published in Polymer (Guilford)
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  7. 7
    Advances in Resist Materials for 193nm Lithography

    Advances in Resist Materials for 193nm Lithography by Bowden, Murrae J., Gabor, Allen H., Dimov, Ognian, Medina, Arturo N., Foster, Patrick, Steinhäusler, Thomas, Biafore, John J., Spaziano, Gregory, Slater, Sydney G., Blakeney, Andrew J., Neisser, Mark O., Houlihan, Frank M., Cirelli, Ray A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L., Sweeney, James R., Timko, Allen G., Nalamasu, Om, Reichmanis, Elsa

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  8. 8
    Advancements and Opportunities for On-Board 700 Bar Compressed Hydrogen Tanks in the Progression Towards the Commercialization of Fuel Cell Vehicles

    Advancements and Opportunities for On-Board 700 Bar Compressed Hydrogen Tanks in the Progression Towards the Commercialization of Fuel Cell Vehicles by Johnson, Kenneth, Veenstra, Michael J, Gotthold, David, Simmons, Kevin, Alvine, Kyle, Hobein, Bert, Houston, Daniel, Newhouse, Norman, Yeggy, Brian, Vaipan, Alex, Steinhausler, Thomas, Rau, Anand

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  9. 9
    Silicon-rich-methacrylate bilayer resist for 193-nm lithography

    Silicon-rich-methacrylate bilayer resist for 193-nm lithography by BLAKENEY, A, GABOR, A, WHITE, D, STEINHÄUSLER, T, DEADY, W, JARMALOWICZ, J, KUNZ, R, DEAN, K, RICH, G, STARK, D

    Published in Solid state technology
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