Proximity effect correction for electron beam lithography : Highly accurate correction method by KAMIKUBO, T, ABE, T, TOJO, T, OOGI, S, ANZE, H, SHIMIZU, M, ITOH, M, NAKASUGI, T, TAKIGAWA, T, IIJIMA, T, HATTORI, Y

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High-Speed Convolution System for Real-Time Proximity Effect Correction by Susumu Oogi, Susumu Oogi, Takiji Ishimura, Takiji Ishimura, Takashi Kamikubo, Takashi Kamikubo, Mitsuko Shimizu, Mitsuko Shimizu, Yoshiaki Hattori, Yoshiaki Hattori, Tomohiro Iijima, Tomohiro Iijima, Hirohito Anze, Hirohito Anze, Takayuki Abe, Takayuki Abe, Toru Tojo, Toru Tojo, Tadahiro Takigawa, Tadahiro Takigawa

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High-Accuracy Proximity Effect Correction for Mask Writing by Abe, Takayuki, Hattori, Yoshiaki, Iijima, Tomohiro, Anze, Hirohito, Oogi, Susumu, Kamikubo, Takashi, Tsuchiya, Seiichi, Shimizu, Matsuki, Kazuto, Inoue, Hideo, Tojo, Takigawa, Tadahiro

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Global Critical Dimension Correction: I. Fogging Effect Correction by Abe, Takayuki, Suzuki, Jun-Ichi, Yashima, Jun, Iijima, Tomohiro, Oogi, Susumu, Anze, Hirohito, Onimaru, Yoshiaki, Tsurumaki, Hideyuki, Tsuchiya, Seiichi, Hattori, Yoshiaki

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High-Speed Convolution System For Real-Time Proximity Effect Correction by Oogi, S., Ishimura, T., Kamikubo, T., Shimizu, M., Hattori, Y., Iijima, T., Anze, H., Abe, T., Tojo, T., Takigawa, T.

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