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Improving channel carrier mobility and immunity to charge trapping of high-K NMOSFET by using stacked Y/sub 2/O/sub 3//HfO/sub 2/ gate dielectric
by
Feng Zhu
,
Se Jong Rhee
,
Chang Yong Kang
,
Chang Hwan Choi
,
Akbar, M.S.
,
Krishnan, S.A.
,
Manhong Zhang
,
Hyoung-Sub Kim
,
Tackwhi Lee
,
Ok, I.
,
Lee, J.C.
Published in
IEEE electron device letters
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Improving channel carrier mobility and immunity to charge trapping of high-K NMOSFET by using stacked Y2O3/HfO2 gate dielectric
by
FENG ZHU
,
SE JONG RHEE
,
LEE, Jack C
,
CHANG YONG KANG
,
CHANG HWAN CHOI
,
AKBAR, Mohammad S
,
KRISHNAN, Siddarth A
,
MANHONG ZHANG
,
KIM, Hyoung-Sub
,
LEE, Tackwhi
,
OK, Injo
Published in
IEEE electron device letters
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Improving channel carrier mobility and immunity to charge trapping of high-K NMOSFET by using stacked Y sub(2)O sub(3)/HfO sub(2) gate dielectric
by
Zhu, Feng
,
Jong Rhee, Se
,
Yong Kang, Chang
,
Hwan Choi, Chang
,
Akbar, MS
,
Krishnan, SA
,
Zhang, Manhong
,
Kim, Hyoung-Sub
,
Lee, Tackwhi
,
Ok, I
,
Lee, J C
Published in
IEEE electron device letters
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Structural optimization and electrical characteristics of ultra-thin gadolinium (Gd/sub 2/O/sub 3/) incorporated HfO/sub 2/ n-MOSFETs
by
Se Jong Rhee
,
Hyoung-Sub Kim
,
Chang Yong Kang
,
Chang Hwan Choi
,
Akbar, M.S.
,
Manhong Zhang
,
Tackwhi Lee
,
Injo Ok
,
Feng Zhu
,
Krishnan, S.A.
,
Jack C. Lee
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Ieee Electron Device Letters
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Subjects
Electron Mobility
3 results
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Hafnium Oxide
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Channel Carrier Mobility
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Charge Trapping
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Fixed Charge
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Flatband Voltage
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Hfo
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High K Dielectric Materials
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High-K Gate Dielectrics
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Leakage Current Density
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Mosfet
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Mosfet Circuits
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Multimetal Oxide
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Annealing
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Applied Sciences
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Charge
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Conducting Materials
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Dielectrics
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Electric Variables
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Electron Traps
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Ieee Electronic Library (Iel) Journals
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Ieee Xplore All Journals
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Ieee Electronic Library (Iel) Conference Proceedings
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Ieee Xplore All Conference Series
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