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Engineering Epitaxial Gamma-Al-2O-3 Gate Dielectric Films on 4H-SiC
by
Tanner, C.M.
,
/UCLA
,
Toney, M.F.
,
/SLAC, SSRL
,
Lu, J.
,
Blom, H.O.
,
/Uppsala U.
,
Sawkar-Mathur, M.
,
Tafesse, M.A.
,
Chang, J.P.
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Journal of applied physics
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Journal Of Applied Physics
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Alignment
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Capacitors
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Dielectric Materials
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Eng
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Leakage Current
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Materials Science
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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American Institute Of Physics
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