Catheter-free Period Over 2 Days Is Associated with Better Outcome in Catheter-related Bloodstream Infection due to Candida by Matsuo, Takahiro, Mori, Nobuyoshi, Hoshino, Eri, Sakurai, Aki, Furukawa, Keiichi

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Clinical Comparison between Native Vertebral Osteomyelitis with Abscess vs Without Abscess in Clinical Features and Outcomes by Matsuo, Takahiro, Mori, Nobuyoshi, Hoshino, Eri, Sakurai, Aki, Furukawa, Keiichi

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Listeria monocytogenes meningitis by Matsuo, Takahiro, Mori, Nobuyoshi, Sakurai, Aki, Furukawa, Keiichi

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Polymicrobial Bloodstream Infections due to Intra-Abdominal Infections: A Retrospective Analysis of 158 Cases at a Tertiary Care Hospital in Japan by Sakurai, Aki, Matsuo, Takahiro, Mori, Nobuyoshi, Takahashi, Osamu, Furukawa, Keiichi

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Candidemia and Endogenous Endophthalmitis at a Tertiary Care Center: Largest Case Series in Japan by Mori, Nobuyoshi, Matsuo, Takahiro, Sakurai, Aki, Furukawa, Keiichi

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Vertebral osteomyelitis as a rare manifestation of Lemierre’s syndrome by Matsuo, Takahiro, Mori, Nobuyoshi, Sakurai, Aki, Mikami, Yumiko, Furukawa, Keiichi

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Varicella-zoster virus myeloencephalitis by Matsuo, Takahiro, Mori, Nobuyoshi, Sakurai, Aki, Furukawa, Keiichi

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Ocular involvement with secondary syphilis in a non-HIV infected man by Matsuo, Takahiro, Mori, Nobuyoshi, Furukawa, Keitaro, Furukawa, Keiichi

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Application of Zirconium Silicon Oxide Films to an Attenuated Phase-Shifting Mask in ArF Lithography by Matsuo, Takahiro, Onodera, Toshio, Nakazawa, Keisuke, Ogawa, Tohru, Morimoto, Hiroaki, Haraguchi, Takashi, Fukuhara, Nobuhiko, Matsuo, Tadashi, Otaki, Masao, Takeuchi, Susumu

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Control of Diffusion Kinetics in ArF Liquid-Phase Silylation Process by MATSUO, TAKAHIRO, ENDO, MASAYUKI

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Stabilization of ZrSi x O y Films by Irradiation with an ArF Excimer Laser by Keisuke Nakazawa, Keisuke Nakazawa, Takahiro Matsuo, Takahiro Matsuo, Toshio Onodera, Toshio Onodera, Tohru Ogawa, Tohru Ogawa, Hiroaki Morimoto, Hiroaki Morimoto

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Investigations on reaction mechanisms in a surface modification resist process using chemical vapor deposition of polysiloxane by MATSUO, T, ENDO, M, SHIRAI, M, TSUNOOKA, M

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Improved bi-layer lift-off process for MEMS applications by Liang, Jinxing, Kohsaka, Fusao, Matsuo, Takahiro, Li, Xuefeng, Ueda, Toshitsugu

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Consideration of silylation contrast in an ArF liquid-phase silylation process by MATSUO, T, OHKUNI, M, ENDO, M

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PBG Fibers for Gas Concentration Measurement by Pawłat, Joanna, Sugiyama, Tadashi, Matsuo, Takahiro, Ueda, Toshitsugu

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Sulfonic Acid Ester Unit-containing Polymers for Surface Modification Resist by Shirai, Masamitsu, Nakanishi, Junji, Tsunooka, Masahiro, Matsuo, Takahiro, Endo, Masayuki

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Advanced Surface Modification Resist Process for ArF Lithography by Matsuo, Takahiro, Endo, Masayuki, Mori, Shigeyasu, Kuhara, Koichi, Sasago, Masaru, Shirai, Masamitsu, Tsunooka, Masahiro

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ArF Surface Modification Resist Process using Polymer System with Polarity Change Unit by Matsuo, Takahiro, Endo, Masayuki, Shirai, Masamitsu, Tsunooka, Masahiro

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STABILIZATION OF ZrSixOy FILMS BY IRRADIATION WITH AN ArF EXCIMER LASER by Nakazawa, K, Matsuo, T, Onodera, T, Ogawa, T, Morimoto, H

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Insulation recovery characteristics after current interruption by various vacuum interrupter electrodes by Matsuo, T., Fujimori, H., Yanabu, S., Ichikawa, H., Matsui, Y., Sakaki, M.

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