Índice Tornozelo-Braquial (ITB) determinado por esfigmomanômetros oscilométricos automáticos by Kawamura, Takao

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Interpretação de um teste sob a visão epidemiológica: eficiência de um teste by Kawamura, Takao

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Phosphoenolpyruvate Carboxylase Prevalent in Maize Roots: Isolation of a cDNA Clone and Its Use for Analyses of the Gene and Gene Expression by Kawamura, Takao, Shigesada, Katsuya, Yanagisawa, Shuichi, Izui, Katsura

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A study of antireflective and antistatic coating with ultrafine particles by Endo, Yoshishige, Ono, Masahiko, Yamada, Toshihiro, Kawamura, Hiromitsu, Kobara, Katsumi, Kawamura, Takao

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Cloning, Expression, and Characterization of a Root-Form Phosphoenolpyruvate Carboxylase from Zea mays: Comparison with the C4-Form Enzyme by Dong, Long-Ying, Masuda, Takao, Kawamura, Takao, Hata, Shingo, Izui, Katsura

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Photocurrent multiplication in amorphous silicon carbide films by HIRAMOTO, M, YOSHIMURA, K, NAKAYAMA, Y, AKITA, S, KAWAMURA, T, YOKOYAMA, M

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Dynamic mechanism of fast switching in light valve using liquid crystal by SUGIMURA, A, KAWAMURA, T

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Behavior of charged particles in an electron cyclotron resonance plasma chemical vapor deposition reactor by NAKAYAMA, Y, KONDOH, M, HITSUISHI, K, ZHANG, M, KAWAMURA, T

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DC bias method for a-Si : H deposition on a dielectric substrate using electron cyclotron resonance plasma by NAKAYAMA, Y, KONDOH, M, HITSUISHI, K, KAWAMURA, T

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The interpretation of a test under an epidemiological view point. Test efficiency by Kawamura, Takao

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Elastic Anchoring Energy Related to Orientational Order Parameter of Nematic Liquid Crystal by Sugimura, Akihiko, Kawamura, Takao

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Vowel Recognition System by Lip-Reading Method Using Active Contour Models and its Hardware Realization by Nakamura, S., Kawamura, T., Sugahara, K.

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A study of initial transient phenomena in the chemical vapor deposition process using silane plasma by NAKAYAMA, Y, OHTSUCHI, T, KAWAMURA, T

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Role of ions in formation of amorphous Si:H network in electron cyclotron resonance plasma chemical vapor deposition by Nakayama, Yoshikazu, Hitsuishi, Kohji, Zhang, Mei, Imamura, Hiroshi, Kawamura, Takao

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Two-way photocurrent-multiplication in amorphous silicon carbide cells by Nakayama, Yoshikazu, Yajima, Takahiro, Ueda, Hiro-omi, Akita, Seiji, Kawamura, Takao

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Depletion-discharge transient spectroscopy: direct determination of the density of deep emission states in amorphous semiconductors by NAKAYAMA, Y, AKITA, S, KAWAMURA, T

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Heteroepitaxial growth of GaAs on sapphire substrates by a three-step method using low pressure MOCVD by Sugimura, Akihiko, Hosoi, Takashi, Ishibitsu, Kokichi, Kawamura, Takao

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Surface-induced nematic ordering using SiO2 grating by SUGIMURA, A, KAWAMURA, T

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Preparation and some properties of highly resistive a-Si:H:F film by NAKAYAMA, Y, AKIYAMA, K, KAWAMURA, T

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High Surface Ordering of Nematic Liquid Crystal Using Periodicity Grating by Sugimura, Akihiko, Yamamoto, Nobuyuki, Kawamura, Takao

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