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RESIST DESIGN CONSIDERATIONS FOR DIRECT WRITE AND PROJECTION ELECTRON-BEAM LITHOGRAPHY TECHNOLOGIES
by
Novembre, Anthony E.
,
Tarascon, Regine G.
,
Berger, Steven D.
,
Biddick, Chris J.
,
Blakey, Myrtle I.
,
Bolan, Kevin J.
,
Fetter, Linus A.
,
Harriott, Lloyd R.
,
Huggins, Harold A.
,
Knurek, Chester S.
,
Liddle, J. Alexander
,
Mixon, David A.
,
Peabody, Milton L.
Published in
Journal of Photopolymer Science and Technology
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The SCattering with Angular Limitation in Projection Electron-beam Lithography (SCALPEL) system
by
LIDDLE, J. A
,
BERGER, S. D
,
CUSTY, J
,
FARROW, R. C
,
FELKER, J. A
,
FETTER, L. A
,
FREEMAN, B
,
HARRIOTT, L. R
,
HOPKINS, L.L
,
HUGGINS, H. A
,
KNUREK, C. S
,
KRAUS, J. S
,
BIDDICK, C. J
,
MIXON, D. A
,
MKRTCHYAN, M. M
,
NOVEMBRE, A. E
,
PEABODY, M. L
,
SIMPSON, W. M
,
TARASCON, R. G
,
WADE, H. H
,
WASKIEWICZ, W. K
,
WATSON, G. P
,
WILLIAMS, J. K
,
BLAKEY, M. I
,
WINDT, D. L
,
BOLAN
,
BOWLER, S. W
,
BRADY, K
,
CAMARDA, R. M
,
CONNELLY, W. F
,
CHORKEN, A
Published in
Japanese Journal of Applied Physics
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Japanese Journal Of Applied Physics
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Japanese Journal Of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers
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Journal Of Photopolymer Science And Technology
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Applied Sciences
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Electron-Beam
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Electronics
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Exact Sciences And Technology
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Lithography
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Materials Chemistry
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Microelectronic Fabrication
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Microfabrication
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Organic Chemistry
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Semiconductor Electronics. Microelectronics. Optoelectronics. Solid State Devices
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Institute Of Physics Iopscience Extra
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