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Search Results - Tarui, Yoichiro
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Characteristics of 4H–SiC MOS interface annealed in N2O
by
Fujihira, Keiko
,
Tarui, Yoichiro
,
Imaizumi, Masayuki
,
Ohtsuka, Ken-ichi
,
Takami, Tetsuya
,
Shiramizu, Tatsuya
,
Kawase, Kazumasa
,
Tanimura, Jyunji
,
Ozeki, Tatsuo
Published in
Solid-state electronics
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Breakthrough in trade-off between threshold voltage and specific on-resistance of SiC-MOSFETs
by
Furuhashi, Masayuki
,
Tanioka, Toshikazu
,
Ebiike, Yuji
,
Suekawa, Eisuke
,
Tarui, Yoichiro
,
Sakai, Shinji
,
Yutani, Naoki
,
Miura, Naruhisa
,
Imaizumi, Masayuki
,
Yamakawa, Satoshi
,
Oomori, Tatsuo
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Heteroepitaxial growth of single crystalline 3C-SiC on Si substrates by gas source molecular beam epitaxy
by
YOSHINOBU, T
,
MITSUI, H
,
TARUI, Y
,
FUYUKI, T
,
MATSUNAMI, H
Published in
Journal of applied physics
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SPECULAR SURFACE MORPHOLOGY OF ALUMINUM-IMPLANTED 4H-SiC(000-1) BY SiH4-ADDED Ar ANNEAL
by
Fujihira, K
,
Tarui, Y
,
Imaizumi, M
,
Ohtsuka, K
,
Takami, T
,
Ozeki, T
Published in
Jpn.J.Appl.Phys ,Part 1. Vol. 43, no. 1, pp. 115-116. 2004
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Low-temperature heteroepitaxial growth of cubic SiC on Si using hydrocarbon radicals by gas source molecular beam epitaxy
by
Hatayama, Tomoaki
,
Tarui, Yoichiro
,
Fuyuki, Takashi
,
Matsunami, Hiroyuki
Published in
Journal of crystal growth
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Controlled carbonization of Si(001) surface using hydrocarbon radicals in ultrahigh vacuum
by
Hatayama, Tomoaki
,
Tarui, Yoichiro
,
Yoshinobu, Tastuo
,
Fuyuki, Takashi
,
Matsunami, Hiroyuki
Published in
Journal of crystal growth
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Cracking of saturated hydrocarbon gas molecular beam for carbonization of Si(001) surface
by
YOSHINOBU, T
,
MITSUI, H
,
TARUI, Y
,
FUYUKI, T
,
MATSUNAMI, H
Published in
Japanese Journal of Applied Physics
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Specular Surface Morphology of Aluminum-Implanted 4H-SiC(000\bar1) by SiH 4 -Added Ar Anneal
by
Fujihira, Keiko
,
Tarui, Yoichiro
,
Imaizumi, Masayuki
,
Ohtsuka, Ken-ichi
,
Takami, Tetsuya
,
Ozeki, Tatsuo
Published in
Japanese Journal of Applied Physics
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Jpn.j.appl.phys ,Part 1. Vol. 43, No. 1, Pp. 115-116. 2004
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