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    New route for selective etching in remote plasma source: Application to the fabrication of horizontal stacked Si nanowires for gate all around devices

    New route for selective etching in remote plasma source: Application to the fabrication of horizontal stacked Si nanowires for gate all around devices by Pargon, Erwine, Petit-Etienne, Camille, Youssef, Laurène, Thomachot, Gaspard, David, Sylvain

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