Properties of epitaxial AlN thin film deposited on sapphire substrate by ECR plasma by Kaneko, Satoru, Ito, Takeshi, Yasui, Manabu, Kurouchi, Masahito, Nagano, Takatoshi, Torii, Hironori, Amazawa, Takao, Lee Seughwan, Sungkyun Park, Tikumasu, Takashi, Takikawa, Hirofumi

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