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Search Results - Tokumasu, Noboru
Search Results - Tokumasu, Noboru
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Thermal desorption spectra of SiO2 films deposited on Si and on thermal SiO2 by tetraethylorthosilicate/O3 atmospheric-pressure chemical vapor deposition
by
Cheng, Degang
,
Tsukamoto, Koji
,
Komiyama, Hiroshi
,
Nishimoto, Yuko
,
Tokumasu, Noboru
,
Maeda, Kazuo
Published in
Journal of applied physics
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Evaluation of Parameters in Atmospheric-Pressure Chemical Vapor Deposition of Borophosphosilicate Glass Using Tetraethylorthosilicate and Ozone
by
Nishimoto, Yuko
,
Tokumasu, Noboru
,
Maeda, Kazuo
Published in
Japanese Journal of Applied Physics
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Low-temperature atmospheric-pressure chemical vapor deposition using 2, 4, 6, 8-tetramethylcyclotetrasiloxane and ozone
by
FUJINO, K
,
NISHIMOTO, Y
,
TOKUMASU, N
,
MAEDA, K
Published in
Japanese Journal of Applied Physics
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Low temperature chemical vapor deposition of high quality SiO2 film using helicon plasma source
by
NISHIMOTO, Y
,
TOKUMASU, N
,
MAEDA, K
Published in
Japanese journal of applied physics
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Morphology Evolution of SiO 2 Films Deposited by Tetraethylorthosilicate/O 3 Atmospheric-Pressure Chemical Vapor Deposition on Thermal SiO 2
by
Tsukamoto, Koji
,
Cheng, Degang
,
Komiyama, Hiroshi
,
Nishimoto, Yuko
,
Tokumasu, Noboru
,
Maeda, Kazuo
Published in
Japanese Journal of Applied Physics
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Low Temperature Chemical Vapor Deposition of High Quality SiO 2 Film Using Helicon Plasma Source
by
Nishimoto, Yuko
,
Tokumasu, Noboru
,
Kazuo Maeda, Kazuo Maeda
Published in
Japanese Journal of Applied Physics
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Evaluating Clinical Genome Sequence Analysis by Watson for Genomics
by
Itahashi, Kota
,
Kondo, Shunsuke
,
Kubo, Takashi
,
Fujiwara, Yutaka
,
Kato, Mamoru
,
Ichikawa, Hitoshi
,
Koyama, Takahiko
,
Tokumasu, Reitaro
,
Xu, Jia
,
Huettner, Claudia S
,
Michelini, Vanessa V
,
Parida, Laxmi
,
Kohno, Takashi
,
Yamamoto, Noboru
Published in
Frontiers in medicine
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Japanese Journal Of Applied Physics
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Japanese Journal Of Applied Physics Part 1-Regular Papers Short Notes & Review Papers
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Frontiers In Medicine
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Japanese Journal Of Applied Physics Part 2-Letters
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Japanese Journal Of Applied Physics, Part 2: Letters
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Japanese Journal Of Applied Physics. Pt. 2, Letters
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Journal Of Applied Physics
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Jpn.j.appl.phys ,Part 2. Vol. 40, No. 10B, Pp. L1078-L1080. 2001
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Methods Of Deposition Of Films And Coatings; Film Growth And Epitaxy
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Microelectronic Fabrication
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Atmospheric Pressure Cvd
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