Search Results - Tomizawa, Kanta

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    Negative differential resistance of CaF2/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process

    Negative differential resistance of CaF2/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process by Kumagai, Yoshiro, Fukuyama, Satoshi, Tonegawa, Hiroki, Mikami, Kizashi, Hirose, Kodai, Tomizawa, Kanta, Ichikawa, Kensuke, Watanabe, Masahiro

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    Negative differential resistance of CaF 2 /Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process

    Negative differential resistance of CaF 2 /Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process by Kumagai, Yoshiro, Fukuyama, Satoshi, Tonegawa, Hiroki, Mikami, Kizashi, Hirose, Kodai, Tomizawa, Kanta, Ichikawa, Kensuke, Watanabe, Masahiro

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