High concentration erbium doping of silicon-rich SiO 2 thin films on silicon by Xu, Fei, Xiao, Zhisong, Cheng, Guoan, Yi, Zhongzhen, Zhang, Tonghe, Gu, Lanlan, Wang, Xun

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Formation and behavior of ceramic layer by ion-deposited Ti coating using FMEVAD and Ti and C dual-implantation by Tonghe, Zhang, Yuguang, Wu, Yenwen, Zhang

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Formation of cobalt silicide films by ion beam deposition by Zhang, Y., McCready, D.E., Wang, C.M., Young, J., McKinley, M.I., Whitlow, H.J., Razpet, A., Possnert, G., Zhang, T., Wu, Y.

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Synthesis of Co-silicides and fabrication of microwave power device using MEVVA source implantation by Zhang, Tonghe, Wu, Yuguang, Qian, Weidong, Liu, Yaodong, Zhang, Xu

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Structure of corrosion resistance on H13 steels with titanium and carbon implantation by Li, Yongliang, Zhang, Tonghe, Wang, Xiaoyan

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Behaviour of MEVVA metal ion implantation for surface modification of materials by Zhang, Tonghe, Wang, Xiaoyan, Liang, Hong, Zhang, Huixing, Zhou, Gu, Sun, Guiru, Zhao, Weijiang, Xue, Jianming

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Optimum silicon ion dose for 1540 nm photoluminescence from erbium-doped silica thin films formed by MEVVA implantation by Xiao, Zhisong, Xu, Fei, Cheng, Guoan, Zhang, Tonghe, Wong, S.P

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Up-conversion luminescence from neodymium ion implantation silicon by Xiao, Zhisong, Cheng, Guoan, Zhang, Tonghe, Xu, Fei

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Sputtering transients for some transition elements during high-fluence MEVVA implantation of Si by Zhang, Yanwen, Zhang, Tonghe, Xiao, Zhisong, Whitlow, Harry J.

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Wear resistance properties of stainless steel modified with co-implantation of V+C by Yi, Zhongzhen, Xiao, Zhisong, Ma, Furong, Zhang, Tonghe, Li, Yonglian

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Corrosion behavior of the embedded layer with nanometer phase in Ti and Ti+C-implanted steel by Zhang, Tonghe, Wu, Yuguang, Zhang, Huixing, Deng, Zhiwei, Zhou, Gu, Liang, Hong, Ma, Furong, Zhang, Xiaoji, Wang, Xiaoyan

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Annealing behaviour of foreign atom incorporated Co-silicides formed by MEVVA implantation into SiO 2/Si and Si 3N 4/Si structures by Zhang, Yanwen, Zhang, Tonghe, Lu, Dian-Tong, Maximov, Ivan A., Sarwe, Eva-Lena, Graczyk, Mariusz, Whitlow, Harry J.

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The effects of Mg and Nb implantation on mean grain size of SnO 2 thin films by Zhang Tao, Zhang Tonghe, Chen Jun, Zhang Huixing, Ma Benkun

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Resistivity stability for polymer modified by metal ion implantation by Wu Yuguang, Zhang Tonghe, Yi Zhongzhen, Zhang Xu, Zhang Huixing, Zhang Xiaoji, Zhou Gu

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The effect of stoichiometric disturbance on activation of MeV Si implantation in GaAs by Zhang, Yanwen, Ding, E-Jiang, Zhang, Tonghe

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Influence of the structure of implanted steel with Y, Y + C and Y + Cr on the behaviors of wear, oxidation and corrosion resistance by Tonghe, Z, Jindong, X, Chengzhou, J, Jun, C, Hong, X, Jing, L, Guiru, S, HuiXing, Z

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Synthesis of Co-silicides and fabrication of microwavepower device using MEVVA source implantation by ZHANG Tonghe(张通和) WU Yuguang(吴瑜光) QIAN Weidong(钱卫东) LIU Yaodong(刘要东) ZHANG Xu(张旭)

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High-fluence Co implantation in Si, SiO2/Si and Si3N4/Si by Zhang, Yanwen, Winzell, Thomas, Zhang, Tonghe, Maximov, Ivan A, Sarwe, Eva-Lena, Graczyk, Mariusz, Montelius, Lars, Whitlow, Harry J

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High-fluence Co implantation in Si, SiO2/Si and Si3N4/Si by Zhang, Yanwen, Winzell, Thomas, Zhang, Tonghe, Maximov, Ivan A, Sarwe, Eva-Lena, Graczyk, Mariusz, Montelius, Lars, Whitlow, Harry J

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Phosphorus electrical activation in high energy P and high flux silicon implanted silicon by Yuguang, Wu, Tonghe, Zhang, Yan, Luo

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