Search Results - Tonotani, Junichi

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  1. 1
    Behavior of incorporated nitrogen in plasma-nitrided silicon oxide formed by chemical vapor deposition

    Behavior of incorporated nitrogen in plasma-nitrided silicon oxide formed by chemical vapor deposition by Shinoda, Nao, Itokawa, Hiroshi, Fujitsuka, Ryota, Sekine, Katsuyuki, Onoue, Seiji, Tonotani, Junichi

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  2. 2
    Measurement of Electron Density of Reactive Plasma Using a Plasma Oscillation Method

    Measurement of Electron Density of Reactive Plasma Using a Plasma Oscillation Method by Kanoh, Masaaki, Tonotani, Junichi, Aoki, Katsuaki, Yamage, Masashi

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  3. 3
    Formation of Ammonium Salts and Their Effects on Controlling Pattern Geometry in the Reactive Ion Etching Process for Fabricating Aluminum Wiring and Polysilicon Gate

    Formation of Ammonium Salts and Their Effects on Controlling Pattern Geometry in the Reactive Ion Etching Process for Fabricating Aluminum Wiring and Polysilicon Gate by Saito, Shuichi, Sugita, Kazuyuki, Tonotani, Junichi, Yamage, Masashi

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  4. 4
    Crystallinity of Bamboo-Based Carbon Filaments for Incandescent Lamps Examined by Raman Spectroscopy as a Nondestructive Means of Analysis

    Crystallinity of Bamboo-Based Carbon Filaments for Incandescent Lamps Examined by Raman Spectroscopy as a Nondestructive Means of Analysis by Ohkawa, Hideki, Yuge, Yoji, Kamata, Hiroshi, Matsuda, Ryotaro, Ito, Yasuo, Miura, Akira, Tonotani, Junichi

    Published in Applied spectroscopy
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  5. 5
    Effect of CHF 3 Addition on Reactive Ion Etching of Aluminum Using Inductively Coupled Plasma

    Effect of CHF 3 Addition on Reactive Ion Etching of Aluminum Using Inductively Coupled Plasma by Saito, Shuichi, Sugita, Kazuyuki, Tonotani, Junichi

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  6. 6
    4.1: Low-Temperature-Processed IGZO TFTs for Flexible AMOLED with Integrated Gate Driver Circuits

    4.1: Low-Temperature-Processed IGZO TFTs for Flexible AMOLED with Integrated Gate Driver Circuits by Miura, Kentaro, Ueda, Tomomasa, Nakano, Shintaro, Saito, Nobuyoshi, Hara, Yujiro, Sugi, Keiji, Sakano, Tatsunori, Yamaguchi, Hajime, Amemiya, Isao, Akimoto, Keiko, Kameoka, Hisashi, Tonotani, Junichi

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  7. 7
    Dry Etching of Cr 2 O 3 /Cr Stacked Film during Resist Ashing by Oxygen Plasma

    Dry Etching of Cr 2 O 3 /Cr Stacked Film during Resist Ashing by Oxygen Plasma by Tonotani, Junichi, Ohmi, Shun-ichiro, Iwai, Hiroshi

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  8. 8
    Annealing condition dependence of electrical characteristics for Dy2O3/Si(100) structures

    Annealing condition dependence of electrical characteristics for Dy2O3/Si(100) structures by TAGUCHI, Junichi, YAMAMOTO, Hiroyuki, TONOTANI, Junichi, OHMI, Shun-Ichiro, IWAI, Hiroshi

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  9. 9
    Stability of High-k Thin Films in Moisture Ambience - The Effect of Dissolution Gas from Acryl Apparatus

    Stability of High-k Thin Films in Moisture Ambience - The Effect of Dissolution Gas from Acryl Apparatus by Akama, S., Kikuchi, A., Tonotani, J., Ohmi, S.-I., Iwai, H.

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