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Metal-oxide-semiconductor capacitors on GaAs with high- k gate oxide and amorphous silicon interface passivation layer
by
Koveshnikov, S.
,
Tsai, W.
,
Ok, I.
,
Lee, J. C.
,
Torkanov, V.
,
Yakimov, M.
,
Oktyabrsky, S.
Published in
Applied physics letters
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Metal-oxide-semiconductor capacitors on GaAs with high- k gate oxideand amorphous silicon interface passivation layer
by
Koveshnikov, S.
,
Tsai, W.
,
Ok, I.
,
Lee, J. C.
,
Torkanov, V.
,
Yakimov, M.
,
Oktyabrsky, S.
Published in
Applied physics letters
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Importance of controlling oxygen incorporation into HfO2∕Si∕n-GaAs gate stacks
by
Zhang, M. H.
,
Oye, M.
,
Cobb, B.
,
Zhu, F.
,
Kim, H. S.
,
Ok, I. J.
,
Hurst, J.
,
Lewis, S.
,
Holmes, A.
,
Lee, J. C.
,
Koveshnikov, S.
,
Tsai, W.
,
Yakimov, M.
,
Torkanov, V.
,
Oktyabrsky, S.
Published in
Journal of applied physics
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Importance of controlling oxygen incorporation into Hf O 2 ∕ Si ∕ n - Ga As gate stacks
by
Zhang, M. H.
,
Oye, M.
,
Cobb, B.
,
Zhu, F.
,
Kim, H. S.
,
Ok, I. J.
,
Hurst, J.
,
Lewis, S.
,
Holmes, A.
,
Lee, J. C.
,
Koveshnikov, S.
,
Tsai, W.
,
Yakimov, M.
,
Torkanov, V.
,
Oktyabrsky, S.
Published in
Journal of applied physics
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Items that this one cites
Article
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Applied Physics Letters
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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Aip Digital Archive
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American Institute Of Physics (Aip) Publications
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