Search Results - Tousseau, Christopher

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    Batch process for atomic layer deposition of hafnium silicate thin films on 300-mm-diameter silicon substrates

    Batch process for atomic layer deposition of hafnium silicate thin films on 300-mm-diameter silicon substrates by Okuyama, Yoshi, Barelli, Carl, Tousseau, Christopher, Park, Seung, Senzaki, Yoshihide

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    Batch process for atomic layer deposition of hafnium silicate thin filmson 300-mm-diameter silicon substrates

    Batch process for atomic layer deposition of hafnium silicate thin filmson 300-mm-diameter silicon substrates by Okuyama, Yoshi, Barelli, Carl, Tousseau, Christopher, Park, Seung, Senzaki, Yoshihide

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    Atomic layer deposition of high-k thin films for gate and capacitor dielectrics

    Atomic layer deposition of high-k thin films for gate and capacitor dielectrics by Senzaki, Y., Chatham, H., Park, S., Bartholomew, L., Lo, T., Okuyama, Y., Barelli, C., Tousseau, C., Fleming, T., Ford, B.

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