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    Effect of Thermal Stresses Formed during Air Annealing of Amorphous Lanthanum Cuprate Thin Films Deposited on Silicon Substrate

    Effect of Thermal Stresses Formed during Air Annealing of Amorphous Lanthanum Cuprate Thin Films Deposited on Silicon Substrate by Tranvouez, Nolwenn, Steyer, Philippe, Malchère, Annie, Boulet, Pascal, Capon, Fabien, Bauer, Jean-Philippe, Pierson, Jean-François

    Published in Coatings (Basel)
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