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Plasma charging damage during contact hole etch in high-density plasma etcher
by
Tsui, Bing-Yue
,
Lin, Shyue-Shyh
,
Tsai, Chia-Shone
,
Hsia, Chin C
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Microelectronics and reliability
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Compounding effects of UV exposure, ion bombardment, electron shading and plasma charging in a high density plasma poly etcher
by
Shyue-Shyh Lin
,
Bing-Yue Tsui
,
Chia-Shone Tsai
,
Hsia, C.C.
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Conference Proceeding
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Plasma damage during dielectric etch in high density plasma etcher
by
Bing-Yue Tsui
,
Shyue-Shyh Lin
,
Chia-Shone Tsai
,
Hsia, C.C.
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Microelectronics And Reliability
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