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Influence of base additives on the reaction-diffusion front of model chemically amplified photoresists
by
Vogt, Bryan D.
,
Kang, Shuhui
,
Prabhu, Vivek M.
,
Rao, Ashwin
,
Lin, Eric K.
,
Wu, Wen-li
,
Satija, Sushil K.
,
Turnquest, Karen
Published in
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
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Responding to the Challenge: Materials Design for Immersion Lithography
by
Padmanaban, Munirathna
,
Romano, Andrew
,
Lin, Guanyang
,
Chiu, Simon
,
Timko, Allen
,
Houlihan, Frank
,
Rahman, Dalil
,
Dammel, Ralph R.
,
Turnquest, Karen
,
Rich, Georgia
,
Shuetter, Scott D.
,
Shedd, Timonthy A.
,
Nellis, Gregory A.
Published in
Journal of Photopolymer Science and Technology
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Measurements of the Reaction−Diffusion Front of Model Chemically Amplified Photoresists with Varying Photoacid Size
by
Vogt, Bryan D
,
Kang, Shuhui
,
Prabhu, Vivek M
,
Lin, Eric K
,
Satija, Sushil K
,
Turnquest, Karen
,
Wu, Wen-li
Published in
Macromolecules
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Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists
by
Kang, Shuhui H.
,
Prabhu, Vivek M.
,
Vogt, Bryan D.
,
Lin, Eric K.
,
Wu, Wen-li
,
Turnquest, Karen
Published in
Polymer (Guilford)
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Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy
by
Kang, Shuhui
,
Vogt, Bryan D.
,
Wu, Wen-li
,
Prabhu, Vivek M.
,
VanderHart, David L.
,
Rao, Ashwin
,
Lin, Eric K.
,
Turnquest, Karen
Published in
Macromolecules
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Responding to the Challenge
by
Padmanaban, Munirathna
,
Romano, Andrew
,
Lin, Guanyang
,
Chiu, Simon
,
Timko, Allen
,
Houlihan, Frank
,
Rahman, Dalil
,
R. Dammel, Ralph
,
Turnquest, Karen
,
Rich, Georgia
,
D. Shuetter, Scott
,
A. Shedd, Timonthy
,
A. Nellis, Gregory
Published in
Journal of photopolymer science and technology
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