Search Results - Tzviatkov, Plamen

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  1. 1
    Modified Acetal Approach to 157nm Resist Design

    Modified Acetal Approach to 157nm Resist Design by Malik, Sanjay, Dilocker, Stephanie, Eisele, Jeff, De, Binod, Bowden, Murrae, Scales, Scott, Hatfield, John, Blakeney, Andrew, Tzviatkov, Plamen, Kokubo, Tadayoshi

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  2. 2
    Design Considerations for Anti-reflection Layer in Thin Imaging System

    Design Considerations for Anti-reflection Layer in Thin Imaging System by Malik, Sanjay, De, Binod, Biafore, John, Spaziano, Greg, Sarubbi, Tom, Dilocker, Stephanie, Bowden, Murrae, Reybrouc, Mario, Grozev, Grozdan, Driessche, Veerle van, Tzviatkov, Plamen

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  3. 3
    Optically enhanced i-line lithography for 0.3-micrometer random logic applications

    Optically enhanced i-line lithography for 0.3-micrometer random logic applications by Yen, Anthony, Tzviatkov, Plamen, Grozev, Grozdan

    Published in Solid state technology
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  4. 4
    Optimizing i-line lithography for 0.3 micron poly-gate manufacturing

    Optimizing i-line lithography for 0.3 micron poly-gate manufacturing by Finders, Jo, Tzviatkov, Plamen, Ronse, Kurt, Van den hove, Luc

    Published in Solid state technology
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  5. 5
    Optimizing i-line lithography for 0.3-μm poly-gate manufacturing

    Optimizing i-line lithography for 0.3-μm poly-gate manufacturing by FINDERS, J, TZYIATKOV, P, RONSE, K, VAN DEN HOVE, L

    Published in Solid state technology
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