Search Results - Ubhi, H.S

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  1. 1
    Ion beam polishing for three‐dimensional electron backscattered diffraction

    Ion beam polishing for three‐dimensional electron backscattered diffraction by SAOWADEE, N., AGERSTED, K., UBHI, H.S., BOWEN, J.R.

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  2. 2
    Biological control of crystallographic architecture: Hierarchy and co-alignment parameters

    Biological control of crystallographic architecture: Hierarchy and co-alignment parameters by Maier, B.J., Griesshaber, E., Alexa, P., Ziegler, A., Ubhi, H.S., Schmahl, W.W.

    Published in Acta biomaterialia
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  3. 3
    Environmental-Assisted Cracking Behavior of Sigmatized Super Duplex Stainless Steel in Oilfield Production Brine

    Environmental-Assisted Cracking Behavior of Sigmatized Super Duplex Stainless Steel in Oilfield Production Brine by SAITHALA, J. R, MAHAJANAM, S, UBHI, H. S, ATKINSON, J

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  4. 4
    Brazed joints in γ TiAl sheet: microstructure and properties

    Brazed joints in γ TiAl sheet: microstructure and properties by Wallis, I.C., Ubhi, H.S., Bacos, M.-P., Josso, P., Lindqvist, J., Lundstrom, D., Wisbey, A.

    Published in Intermetallics
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  5. 5
    The effect of high temperature exposure on the tensile properties of γ TiAl alloys

    The effect of high temperature exposure on the tensile properties of γ TiAl alloys by Pather, R, Mitten, W.A, Holdway, P, Ubhi, H.S, Wisbey, A, Brooks, J.W

    Published in Intermetallics
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  6. 6
    Diamond fibres by a hot filament CVD process

    Diamond fibres by a hot filament CVD process by Griffith, P.W., Wisbey, A., Shatwell, R.A., Ubhi, H.S., Meaden, G.M., Loader, C.B.

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  7. 7
    The influence of manganese and silicon on the precipitation of vanadium carbide in steel

    The influence of manganese and silicon on the precipitation of vanadium carbide in steel by Ubhi, H.S., Baker, T.N.

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  8. 8
    Under-mask beard cover (Singh Thattha technique) for donning respirator masks in COVID-19 patient care

    Under-mask beard cover (Singh Thattha technique) for donning respirator masks in COVID-19 patient care by Singh, R., Safri, H.S., Singh, S., Ubhi, B.S., Singh, G., Alg, G.S., Randhawa, G., Gill, S.

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  9. 9
    Total ionizing dose hardness analysis of transistors in commercial 180 nm CMOS technology

    Total ionizing dose hardness analysis of transistors in commercial 180 nm CMOS technology by Kumar, Mukesh, Ubhi, Jagpal Singh, Basra, Sanjeev, Chawla, Anuj, Jatana, H.S.

    Published in Microelectronics
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