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Search Results - Umemoto, Tomokazu
Search Results - Umemoto, Tomokazu
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Iridium-catalyzed hydroboration of alkenes with pinacolborane
by
Yamamoto, Yasunori
,
Fujikawa, Rhyou
,
Umemoto, Tomokazu
,
Miyaura, Norio
Published in
Tetrahedron
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Relationship between Oxygen Additive Amount and Photoresist Removal Rate Using H Radicals Generated on an Iridium Hot-Wire Catalyst
by
Yamamoto, Masashi
,
Shiroi, Tomohiro
,
Shikama, Tomokazu
,
Nagaoka, Shiro
,
Umemoto, Hironobu
,
Horibe, Hideo
Published in
Journal of Photopolymer Science and Technology
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Photoactive Compounds Effects on Removal Rate for Polystyrene-type Polymers by H2/O2 Mixture Activated by Hot Tungsten Wire
by
Yamamoto, Masashi
,
Akita, Koki
,
Maniwa, Tomohiro
,
Asakawa, Machi
,
Shikama, Tomokazu
,
Nagaoka, Shiro
,
Umemoto, Hironobu
,
Horibe, Hideo
Published in
Journal of Photopolymer Science and Technology
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Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals
by
Yamamoto, Masashi
,
Taki, Tomohiro
,
Sunada, Takuto
,
Shikama, Tomokazu
,
Nagaoka, Shiro
,
Umemoto, Hironobu
,
Horibe, Hideo
Published in
Journal of Photopolymer Science and Technology
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Oxygen additive amount dependence of rate of photoresist removal by H radicals generated on a tungsten hot-wire catalyst
by
Yamamoto, Masashi
,
Umemoto, Hironobu
,
Ohdaira, Keisuke
,
Shikama, Tomokazu
,
Nishiyama, Takashi
,
Horibe, Hideo
Published in
Japanese Journal of Applied Physics
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Enhancement of Removal Uniformity by Oxygen Addition for Photoresist Removal Using H Radicals Generated on a Tungsten Hot-Wire Catalyst
by
Yamamoto, Masashi
,
Maejima, Kazuma
,
Umemoto, Hironobu
,
Ohdaira, Keisuke
,
Shikama, Tomokazu
,
Nishiyama, Takashi
,
Horibe, Hideo
Published in
Journal of Photopolymer Science and Technology
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Pressure Dependence of Photoresist Removal Rate Using Hydrogen Radicals
by
Yamamoto, Masashi
,
Shiroi, Tomohiro
,
Nagaoka, Shiro
,
Shikama, Tomokazu
,
Umemoto, Hironobu
,
Ohdaira, Keisuke
,
Takagi, Seiji
,
Nishiyama, Takashi
,
Horibe, Hideo
Published in
Journal of Photopolymer Science and Technology
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Enhancement of Photoresist Removal Rate by Using Atomic Hydrogen Generated under Low-pressure Conditions
by
Yamamoto, Masashi
,
Umemoto, Hironobu
,
Ohdaira, Keisuke
,
Nagaoka, Shiro
,
Shikama, Tomokazu
,
Nishiyama, Takashi
,
Horibe, Hideo
Published in
Journal of Photopolymer Science and Technology
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O1G-5-4 Transcriptome analysis using next generation sequencing on Novel cancer immunological tolerance model
by
Tomokazu Hirota
,
Yasuhito Shimada
,
Michiko Ariyoshi
,
Junya Kuroyanagi
,
Noriko Umemoto
,
Yuhei Nishimura
,
Toshio Tanaka
Published in
Journal of Pharmacological Sciences
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O2F-5-4 Cross-species transcriptome analyses discovered MXD3 regulation in visceral adiposity
by
Yasuhito Shimada
,
Michiko Ariyoshi
,
Tomokazu Hirota
,
Junya Kuroyanagi
,
Noriko Umemoto
,
Yuhei Nishimura
,
Toshio Tanaka
Published in
Journal of Pharmacological Sciences
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