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Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept
by
Petric, Paul
,
Bevis, Chris
,
McCord, Mark
,
Carroll, Allen
,
Brodie, Alan
,
Ummethala, Upendra
,
Grella, Luca
,
Cheung, Anthony
,
Freed, Regina
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Journal of vacuum science and technology. B, Nanotechnology & microelectronics
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Challenges in the application of hybrid reluctance actuators in scanning positioning stages in vacuum with nanometer accuracy and mGauss magnetic stray field
by
van Lievenoogen, Anne
,
Toma, Adrian
,
Ummethala, Upendra
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Applications of control systems and optimization in the design of semiconductor capital equipment
by
Ummethala, Upendra
,
Hench, John J.
,
van Lievenoogen, Anne
,
Subrahmanyan, Pradeep
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Journal Of Vacuum Science & Technology B, Nanotechnology And Microelectronics: Materials, Processing, Measurement, And Phenomena
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Journal Of Vacuum Science & Technology. B, Microelectronics And Nanometer Structures Processing, Measurement And Phenomena
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Journal Of Vacuum Science And Technology. B, Nanotechnology & Microelectronics
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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