Search Results - Ushita, Katsumi

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    Spontaneous Inclusion of Oxygen in Sputter-Deposited Amorphous Silicon during and after Fabrication

    Spontaneous Inclusion of Oxygen in Sputter-Deposited Amorphous Silicon during and after Fabrication by Imura, Takeshi, Ushita, Katsumi, Hiraki, Akio

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    Dependence of RF Power on the Content and Configuration of Hydrogen in Amorphous Hydrogenated Silicon by Reactive Sputtering

    Dependence of RF Power on the Content and Configuration of Hydrogen in Amorphous Hydrogenated Silicon by Reactive Sputtering by Imura, Takeshi, Ushita, Katsumi, Mogi, Kazuhisa, Hiraki, Akio

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    Characterization of Hydrogenated Amorphous Silicon: Some Behaviors of Hydrogen and Impurities Studied by Film Characterization Techniques

    Characterization of Hydrogenated Amorphous Silicon: Some Behaviors of Hydrogen and Impurities Studied by Film Characterization Techniques by Imura, Takeshi, Kubota, Kazuyoshi, Ushita, Katsumi, Hiraki, Akio

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