Search Results - Ustalov, V.V.

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  1. 1
    Low energy plasma chemical reactor with coaxial magnetic field for precision etching of elements with submicron size

    Low energy plasma chemical reactor with coaxial magnetic field for precision etching of elements with submicron size by Pavlenko, V.N., Ustalov, V.V., Fedorovich, O.A.

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  2. 2
    Selective etching of multilevel submicron structures in plasma-chemical reactor (PCR) with low ion energy

    Selective etching of multilevel submicron structures in plasma-chemical reactor (PCR) with low ion energy by Ustalov, V.V., Fedorovich, O.A., Levitskaja, S.K.

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  3. 3
    Plasma-chemical reactor with low ion energy for selective etching

    Plasma-chemical reactor with low ion energy for selective etching by Ustalov, V.V., Fedorovich, O.A., Vdovenkov, A.A., Levitskaja, S.K.

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