Search Results - Végh, Joseph J

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  1. 1
    Molecular dynamics simulations of oxygen-containing polymer sputtering and the Ohnishi parameter

    Molecular dynamics simulations of oxygen-containing polymer sputtering and the Ohnishi parameter by Choudhary, Gopal K, Végh, Joseph J, Graves, David B

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  2. 2
    Molecular Dynamics Simulations of Ar+-Organic Polymer Interactions

    Molecular Dynamics Simulations of Ar+-Organic Polymer Interactions by Végh, Joseph J., Graves, David B.

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  3. 3
    Molecular dynamics simulations of sub-10 nm wavelength surface rippling by {\rm CF}_3^+ ion beams

    Molecular dynamics simulations of sub-10 nm wavelength surface rippling by {\rm CF}_3^+ ion beams by Végh, Joseph J, Graves, David B

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  4. 4
    A molecular dynamics study of H radical bombardment of CH3 : Si(1 0 0)— comparison of simulation and experiment

    A molecular dynamics study of H radical bombardment of CH3 : Si(1 0 0)— comparison of simulation and experiment by Végh, Joseph J, Graves, David B

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  5. 5
    Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejection

    Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejection by Végh, Joseph J., Humbird, David, Graves, David B.

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  6. 6
    Silicon etch by fluorocarbon and argon plasmas in the presence of fluorocarbon films

    Silicon etch by fluorocarbon and argon plasmas in the presence of fluorocarbon films by Végh, Joseph J., Humbird, David, Graves, David B.

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  7. 7
    Plasma Process. Polym. 5/2009

    Plasma Process. Polym. 5/2009 by Végh, Joseph J., Graves, David B.

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  8. 8
    Molecular dynamics simulations of sub-10 nm wavelength surface rippling by ion beams

    Molecular dynamics simulations of sub-10 nm wavelength surface rippling by ion beams by Végh, Joseph J, Graves, David B

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  9. 9
    A molecular dynamics study of H radical bombardment of CH 3  : Si(1 0 0)— comparison of simulation and experiment

    A molecular dynamics study of H radical bombardment of CH 3  : Si(1 0 0)— comparison of simulation and experiment by Végh, Joseph J, Graves, David B

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  10. 10
    Silicon etch by fluorocarbon and argon plasmas in the presenceof fluorocarbon films

    Silicon etch by fluorocarbon and argon plasmas in the presenceof fluorocarbon films by Végh, Joseph J., Humbird, David, Graves, David B.

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  11. 11
    Molecular dynamics simulations of sub-10 nm wavelength surface rippling by CF+3 ion beams

    Molecular dynamics simulations of sub-10 nm wavelength surface rippling by CF+3 ion beams by VEGH, Joseph J, GRAVES, David B

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  12. 12
    Molecular Dynamics Simulations of Ar+―Organic Polymer Interactions: Modeling and Simulation of Low-Temperature Plasmas

    Molecular Dynamics Simulations of Ar+―Organic Polymer Interactions: Modeling and Simulation of Low-Temperature Plasmas by VEGH, Joseph J, GRAVES, David B

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  13. 13
    QUATUOR A CORDES N °17 EN FA MAJEUR OP. 3 N °5 / Joseph HAYDN ; LE QUATUOR VEGH

    QUATUOR A CORDES N °17 EN FA MAJEUR OP. 3 N °5 / Joseph HAYDN ; LE QUATUOR VEGH by Haydn, Joseph (1732-1809). Auteur ou responsable intellectuel, Végh Quartet. Interprète

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  14. 14
    Elementary Problems: E1885-E1894

    Elementary Problems: E1885-E1894 by Daykin, D. E., Eliezer, C. J., Sanders, W. M., Reich, Simeon, Lindner, C. C., Arkin, Joseph, Vegh, Emanuel, Livingston, A. E., Hausner, Melvin, Magriel, Paul, Reid, J. H., Whipple, K. E.

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