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Actinic extreme ultraviolet lithography mask blank defect inspection by photoemission electron microscopy
by
Lin, Jingquan
,
Neuhaeusler, Ulrich
,
Slieh, Jawad
,
Brechling, Armin
,
Kleineberg, Ulf
,
Heinzmann, Ulrich
,
Oelsner, Andreas
,
Valdaitsev, Dima
,
Schoenhense, Gerd
,
Weber, Nils
,
Escher, Matthias
,
Merkel, Michael
Published in
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
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Actinic extreme ultraviolet lithography mask blank defect inspectionby photoemission electron microscopy
by
Lin, Jingquan
,
Neuhaeusler, Ulrich
,
Slieh, Jawad
,
Brechling, Armin
,
Kleineberg, Ulf
,
Heinzmann, Ulrich
,
Oelsner, Andreas
,
Valdaitsev, Dima
,
Schoenhense, Gerd
,
Weber, Nils
,
Escher, Matthias
,
Merkel, Michael
Published in
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
Get full text
Items that this one cites
Article
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Journal Of Vacuum Science & Technology. B, Microelectronics And Nanometer Structures Processing, Measurement And Phenomena
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Journal Of Vacuum Science And Technology. B, Nanotechnology & Microelectronics
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Engineering
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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