Elevated source/drain by sacrificial selective epitaxy for high performance deep submicron CMOS: Process window versus complexity by Augendre, E., Rooyackers, R., Caymax, M., Vandamme, E.P., De Keersgieter, A., Perello, C., Van Dievel, M., Pochet, S., Badenes, G.

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The isocurrent test: A promising tool for wafer-level evaluation of the interconnect reliability by Witvrouw, A., van Dooren, S., Wouters, D., van Dievel, M., Maex, K.

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Evaluation of TSV and micro-bump probing for wide I/O testing by Smith, K., Hanaway, P., Jolley, M., Gleason, R., Strid, E., Daenen, T., Dupas, L., Knuts, B., Marinissen, E. J., Van Dievel, M.

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A High Performance 0.18 um Elevated Source/Drain Technology with Improved Manufacturability by Augendre, E., Rooyackers, R., Vandamme, E., Perello, C., Van Dievel, M., Pochet, S., Badenes, G.

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The isocurrent test: a promising tool for wafer-level evaluation of the interconnect reliability by Witvrow, A., Van Dooren, S., Wouters, D., Van Dievel, M., Maex, K.

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Financing mental health care in Europe by Knapp, Martin, McDaid, David, Amaddeo, Francesco, Constantopoulos, Athanassios, Oliveira, Mónica D., Salvador-Carulla, Luis, Zechmeister, Ingrid

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Moving beyond the mental health care system: An exploration of the interfaces between health and non-health sectors by McDaid, David, Oliveira, Mónica D., Jurczak, Kasia, Knapp, Martin

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Mental health and employment: An overview of patterns and policies across Western Europe by Curran, Claire, Knapp, Martin, McDaid, David, Tómasson, Kristinn

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