Electron beam deposition for nanofabrication: Insights from surface science by Wnuk, J.D., Rosenberg, S.G., Gorham, J.M., van Dorp, W.F., Hagen, C.W., Fairbrother, D.H.

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One nanometer structure fabrication using electron beam induced deposition by van Dorp, W.F., Hagen, C.W., Crozier, P.A., van Someren, B., Kruit, P.

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Perspectives for regulating 10 nm particle number emissions based on novel measurement methodologies by Samaras, Z., Rieker, M., Papaioannou, E., van Dorp, W.F., Kousoulidou, M., Ntziachristos, L., Andersson, J., Bergmann, A., Hausberger, S., Keskinen, J., Karjalainen, P., Martikainen, S., Mamakos, A., Haisch, Ch, Kontses, A., Toumasatos, Z., Landl, L., Bainschab, M., Lähde, T., Piacenza, O., Kreutziger, P., Bhave, A.N., Lee, K.F., Akroyd, J., Kraft, M., Kazemimanesh, M., Boies, A.M., Focsa, C., Duca, D., Carpentier, Y., Pirim, C., Noble, J.A., Lancry, O., Legendre, S., Tritscher, T., Spielvogel, J., Horn, H.G., Pérez, A., Paz, S., Zarvalis, D., Melas, A., Baltzopoulou, P., Vlachos, N.D., Chasapidis, L., Deloglou, D., Daskalos, E., Tsakis, A., Konstandopoulos, A.G., Zinola, S., Di Iorio, S., Catapano, F., Vaglieco, B.M., Burtscher, H., Nicol, G., Zamora, D., Maggiore, M.

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Si amorphization by focused ion beam milling: Point defect model with dynamic BCA simulation and experimental validation by Huang, J., Loeffler, M., Muehle, U., Moeller, W., Mulders, J.J.L., Kwakman, L.F.Tz, Van Dorp, W.F., Zschech, E.

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Electronic pathways in nanostructure fabrication by Hagen, C.W., van Dorp, W.F., Crozier, P.A., Kruit, P.

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Electron beam induced deposited etch masks by Heerkens, C.Th.H., Kamerbeek, M.J., van Dorp, W.F., Hagen, C.W., Hoekstra, J.

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