Search Results - Van Peski, C. K.

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  1. 1
    Behavior of fused silica irradiated by low level 193 nm excimer laser for tens of billions of pulses

    Behavior of fused silica irradiated by low level 193 nm excimer laser for tens of billions of pulses by Van Peski, C.K, Morton, R, Bor, Z

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  2. 2
    Electrostatic chucking for extreme ultraviolet lithography: Simulations and experiments

    Electrostatic chucking for extreme ultraviolet lithography: Simulations and experiments by Nataraju, M., Sohn, J., Veeraraghavan, S., Mikkelson, A. R., Turner, K. T., Engelstad, R. L., Van Peski, C. K., Orvek, K. J.

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  3. 3
    Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

    Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications by Liberman, V, Rothschild, M, Sedlacek, J H, Uttaro, R S, Grenville, A, Bates, A K, Van Peski, C

    Published in Optics letters
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  4. 4
    Materials issues for optical components and photomasks in 157 nm lithography

    Materials issues for optical components and photomasks in 157 nm lithography by Liberman, V., Bloomstein, T. M., Rothschild, M., Sedlacek, J. H. C., Uttaro, R. S., Bates, A. K., Van Peski, C., Orvek, K.

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  5. 5
    157 nm: Deepest deep-ultraviolet yet

    157 nm: Deepest deep-ultraviolet yet by Rothschild, M., Bloomstein, T. M., Curtin, J. E., Downs, D. K., Fedynyshyn, T. H., Hardy, D. E., Kunz, R. R., Liberman, V., Sedlacek, J. H. C., Uttaro, R. S., Bates, A. K., Van Peski, C.

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