Search Results - Vanamurthy, Lakshmanan

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  1. 1
    Cu penetration into low-k dielectric during deposition and bias-temperature stress

    Cu penetration into low-k dielectric during deposition and bias-temperature stress by He, Ming, Novak, Steven, Vanamurthy, Lakshmanan, Bakhru, Hassaram, Plawsky, Joel, Lu, Toh-Ming

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  2. 2
    Origin of highly spatially selective etching in deeply implanted complex oxides

    Origin of highly spatially selective etching in deeply implanted complex oxides by Ofan, Avishai, Gaathon, Ophir, Vanamurthy, Lakshmanan, Bakhru, Sasha, Bakhru, Hassaram, Evans-Lutterodt, Kenneth, Osgood, Richard M.

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  3. 3
    Subnanometer-resolution depth profiling of boron atoms and lattice defects in silicon ultrashallow junctions by ion beam techniques

    Subnanometer-resolution depth profiling of boron atoms and lattice defects in silicon ultrashallow junctions by ion beam techniques by Vanamurthy, Lakshmanan H., Huang, Mengbing, Bakhru, Hassaram, Furukawa, Toshiharu, Berliner, Nathaniel, Herman, Joshua, Zhu, Zhengmao, Ronsheim, Paul, Doris, Bruce

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  4. 4
    Cu penetration into low- k dielectric during deposition andbias-temperature stress

    Cu penetration into low- k dielectric during deposition andbias-temperature stress by He, Ming, Novak, Steven, Vanamurthy, Lakshmanan, Bakhru, Hassaram, Plawsky, Joel, Lu, Toh-Ming

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  5. 5
    Fabrication of freestanding LiNbO3 thin films via He implantation and femtosecond laser ablation

    Fabrication of freestanding LiNbO3 thin films via He implantation and femtosecond laser ablation by Gaathon, Ophir, Ofan, Avishai, Dadap, Jerry I., Vanamurthy, Lakshmanan, Bakhru, Sasha, Bakhru, Hassaram, Osgood, Richard M.

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  6. 6
    Fabrication of freestanding LiNbO 3 thin films via He implantation and femtosecond laser ablation

    Fabrication of freestanding LiNbO 3 thin films via He implantation and femtosecond laser ablation by Gaathon, Ophir, Ofan, Avishai, Dadap, Jerry I., Vanamurthy, Lakshmanan, Bakhru, Sasha, Bakhru, Hassaram, Osgood, Richard M.

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  7. 7
    Origin of highly spatially selective etching in deeply implantedcomplex oxides

    Origin of highly spatially selective etching in deeply implantedcomplex oxides by Ofan, Avishai, Gaathon, Ophir, Vanamurthy, Lakshmanan, Bakhru, Sasha, Bakhru, Hassaram, Evans-Lutterodt, Kenneth, Osgood, Richard M.

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  8. 8
    Application of ion beams in the study of depth profiling of nitrogen

    Application of ion beams in the study of depth profiling of nitrogen by Vanamurthy, Lakshmanan H., Haberl, Arthur W., Bakhru, Hassaram

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  9. 9
    Thermal Stability Study of Pore Sealing Using Parylene N

    Thermal Stability Study of Pore Sealing Using Parylene N by Ou, Ya, Wang, Pei-I, Vanamurthy, Lakshmanan H., Bakhru, Hassaram, Lu, T.-M., Spencer, Greg

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  10. 10
    Oxide heterogrowth on ion-exfoliated thin-film complex oxide substrates

    Oxide heterogrowth on ion-exfoliated thin-film complex oxide substrates by Chen, Tsung-Liang, Kou, Angela, Ofan, Avishai, Gaathon, Ophir, Osgood, R.M., Gang, Oleg, Vanamurthy, Lakshmanan, Bakhru, Sasha, Bakhru, Hassaram

    Published in Thin solid films
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  11. 11
    Variation improvement for manufacturable FINFET technology

    Variation improvement for manufacturable FINFET technology by Pal, Rohit, Togo, Mitsuhiro, Yoong Yong, Vanamurthy, Lakshmanan, Muralidharan, Sruthi, Xing Zhang, Carter, Richard, Eller, Manfred, Samavedam, Srikanth

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