Search Results - Vavasour, Oliver J

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    Effect of HCl cleaning on InSb-Al2O3 MOS capacitors

    Effect of HCl cleaning on InSb-Al2O3 MOS capacitors by Vavasour, Oliver J, Jefferies, Richard, Walker, Marc, Roberts, Joseph W, Meakin, Naomi R, Gammon, Peter M, Chalker, Paul R, Ashley, Tim

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    Effect of HCl cleaning on InSb–Al 2 O 3 MOS capacitors

    Effect of HCl cleaning on InSb–Al 2 O 3 MOS capacitors by Vavasour, Oliver J, Jefferies, Richard, Walker, Marc, Roberts, Joseph W, Meakin, Naomi R, Gammon, Peter M, Chalker, Paul R, Ashley, Tim

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    (Invited, Digital Presentation) Improved Reliability of 4H-SiC Metal-Oxide-Semiconductor Devices Utilising Atomic Layer Deposited Layers with Enhanced Interface Quality

    (Invited, Digital Presentation) Improved Reliability of 4H-SiC Metal-Oxide-Semiconductor Devices Utilising Atomic Layer Deposited Layers with Enhanced Interface Quality by Renz, Arne Benjamin Benjamin, Vavasour, Oliver J, Gammon, Peter Michael, Li, Fan, Dai, Tianxiang, Baker, Guy W C, Grant, Nicholas E, Murphy, John D, Mawby, P. A., Shah, Vishal Ajit, Gott, James

    Published in ECS transactions
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