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Smooth and high quality epitaxial strained Ge grown on SiGe strain relaxed buffers with 70–85% Ge
by
Loo, Roger
,
Souriau, Laurent
,
Ong, Patrick
,
Kenis, Karine
,
Rip, Jens
,
Storck, Peter
,
Buschhardt, Thomas
,
Vorderwestner, Martin
Published in
Journal of crystal growth
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(Invited) Epitaxial Growth of Low Defect SiGe Buffer Layers for Integration of New Materials on 300 mm Silicon Wafers
by
Kozlowski, Gregorz
,
Fursenko, Oksana
,
Zaumseil, Peter
,
Schroeder, Thomas
,
Vorderwestner, Martin
,
Storck, Peter
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Conference Proceeding
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Antimony surfactant for epitaxial growth of SiGe buffer layers at high deposition temperatures
by
Storck, Peter
,
Vorderwestner, Martin
,
Kondratyev, Alexey
,
Talalaev, Roman
,
Amamchyan, Art
,
Woelk, Egbert
Published in
Thin solid films
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Journal Of Crystal Growth
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Thin Solid Films
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Materials Science
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Materials Science, Multidisciplinary
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Physical Sciences
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Science & Technology
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Chemical Vapor Deposition
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Cross-Disciplinary Physics: Materials Science; Rheology
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Methods Of Deposition Of Films And Coatings; Film Growth And Epitaxy
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Physics
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Physics, Applied
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A1. Interface Contamination
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A1. Surface Roughness
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A3. Chemical Vapor Deposition Processes
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B2. Strained Ge
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B2. Virtual Substrates
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Buffers
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Condensed Matter: Structure, Mechanical And Thermal Properties
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Crystallography
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Cvd
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Backfile Package - Physics General (Legacy) [Ypa]
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Institute Of Physics:jisc Collections:iop Publishing Read And Publish 2024-2025 (Reading List)
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Institute Of Physics Iopscience Extra
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