Search Results - WASHIDZU, G

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  1. 1
    Properties of titanium nitride films for barrier metal in aluminum ohmic contact systems

    Properties of titanium nitride films for barrier metal in aluminum ohmic contact systems by HARA, T, YAMANOUE, A, IIO, H, INOUE, K, WASHIDZU, G, NAKAMURA, S

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  2. 2
    In situ stress measurement of chemical vapor deposited tungsten silicides

    In situ stress measurement of chemical vapor deposited tungsten silicides by WASHIDZU, G, HARA, T, MIYAMOTO, T, INOUE, T

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  3. 3
    Damage induced by electron cyclotron resonance plasma etching on silicon surface

    Damage induced by electron cyclotron resonance plasma etching on silicon surface by WASHIDZU, G, HARA, T, HIYOSHI, J, SASAKI, M, SUZUKI, Y, UKAI, K

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  4. 4
    Dose and damage measurement in low dose ion implantation in silicon by photo-acoustic displacement and minority carrier lifetime

    Dose and damage measurement in low dose ion implantation in silicon by photo-acoustic displacement and minority carrier lifetime by WASHIDZU, G, HARA, T, ICHIKAWA, R, TAKAMATSU, H, SUMIE, S, NISHIMOTO, NAKAI, Y, HASHIZUME, H, MIYOSHI, T

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