Design and Characterization of the Deep-Trench, U-Shaped Field-Plate Edge Termination for 1200-V-Class SiC Devices by Liu, Yong, Yang, Wentao, Feng, Hao, Huang, Linhua, Onozawa, Yuichi, Wakimoto, Setsuko, Fujishima, Naoto, Sin, Johnny K. O.

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Trench Field Plate Engineering for High Efficient Edge Termination of 1200 V-class SiC Devices by Liu, Yong, Yang, Wentao, Feng, Hao, Onozawa, Yuichi, Wakimoto, Setsuko, Fujishima, Naoto, Sin, Johnny K.O.

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Gettering effect of high-dose arsenic implantation and boron diffusion on gate oxide integrity in trench isolated high-voltage silicon-on-insulator process by Lu, D.H., Jimbo, S., Fujishima, N., Wakimoto, S., Ogino, M.

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Preseptal cellulitis with Streptococcus pyogenes complicated by streptococcal toxic shock syndrome: A case report and review of literature by Oyama, Setsuko, Adachi-Katayama, Maho, Okamoto, Koh, Jin, Chihiro, Yamamura, Koji, Saito, Yuki, Kanematsu, Aoi, Otani, Amato, Wakimoto, Yuji, Oyabu, Tatsunori, Jubishi, Daisuke, Hashimoto, Hideki, Harada, Sohei, Okugawa, Shu, Moriya, Kyoji

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