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    Deposition and Characterization of Low-Stress Plasma Enhanced Chemical Vapor Deposition of Tetraethoxysilane Oxide for Micro-Electro-Mechanical-Systems Applications

    Deposition and Characterization of Low-Stress Plasma Enhanced Chemical Vapor Deposition of Tetraethoxysilane Oxide for Micro-Electro-Mechanical-Systems Applications by Chang, Chin-Piao, Wang, Yeong-Shing, Huang, Ruey-Shing

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