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Atomistic comparative study of VUV photodeposited silicon nitride on InP(1 0 0) by simulation and atomic force microscopy: discrete representation and topological analysis
by
Flicstein, J
,
Guillonneau, E
,
Marquez, J
,
How Kee Chun, L.S
,
Maisonneuve, D
,
David, C
,
Wang, Zh.Zh
,
Palmier, J.F
,
Courant, J.L
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Computational materials science
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Cross-Disciplinary Physics: Materials Science; Rheology
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Methods Of Deposition Of Films And Coatings; Film Growth And Epitaxy
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