Search Results - Willets, Christa

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  1. 1
    A Self-Aligned Sacrificial Emitter Process for High Performance SiGe HBT in BiCMOS

    A Self-Aligned Sacrificial Emitter Process for High Performance SiGe HBT in BiCMOS by Liu, Q.Z., Adkisson, James, Benoit, John, Camillo-Castillo, Renata, Chan, Kevin, Cheng, Peng, Ellis-Monaghan, John, Gabert, Tom, Gambino, Jeff, Gray, Peter, Hasselbach, Joe, Jain, Vibhor, Khater, Marwan, Leidy, Bob, Park, Dae-Gyu, Pekarik, Jack, Tiersch, Matt, Willets, Christa, Zetterlund, Bjorn K., Harame, D. L.

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  2. 2
    Effects and prevention of source/drain ion implantation into the polysilicon in a BiCMOS technology

    Effects and prevention of source/drain ion implantation into the polysilicon in a BiCMOS technology by Hook, T.B., Piccirillo, J., Willets, C.

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    Yield improvement for a 3.5-ns BiCMOS technology in a 200-mm manufacturing line

    Yield improvement for a 3.5-ns BiCMOS technology in a 200-mm manufacturing line by Chen, B., Hook, T., Starkey, G., Bhattacharyya, A., Faucher, M., Racine, C., Willets, C., Eslinger, S., Kulkarni, S., King, W., Washburn, C., Piccirillo, J., Mongeon, S., Johnson, A., Gabrielle, E.

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