Search Results - Willoughby, A.F.

  • Showing 1 - 4 results of 4
Refine Results
  1. 1
    Effect of Fluorine Implantation Dose on Boron Transient Enhanced Diffusion and Boron Thermal Diffusion in Si $_1-x$ Ge $_x

    Effect of Fluorine Implantation Dose on Boron Transient Enhanced Diffusion and Boron Thermal Diffusion in Si $_1-x$ Ge $_x by ElMubarek, H.A.W., Karunaratne, M., Bonar, J.M., Dilliway, G.D., Wang, Y., Hemment, P.L.F., Willoughby, A.F., Ashburn, P.

    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  2. 2
    Effect of fluorine implantation dose on boron thermal diffusion in silicon

    Effect of fluorine implantation dose on boron thermal diffusion in silicon by El Mubarek, H. A. W., Bonar, J. M, Dilliway, G. D., Ashburn, P., Karunaratne, M., Willoughby, A. F., Wang, Y., Hemment, P. L. F., Price, R., Zhang, J., Ward, P.

    Get full text
    Items that this one cites
    Items that cite this one
    Article
    Save to List
    Saved in:
  3. 3
    Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si1-xGex

    Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si1-xGex by EL MUBAREK, H. A. W, KARUNARATNE, M, BONAR, J. M, DILLIWAY, G. D, WANG, Y, HEMMENT, P. L. F, WILLOUGHBY, A. F, ASHBURN, P

    Get full text
    Article
    Save to List
    Saved in:
  4. 4
    Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si/sub 1-x/Ge/sub x

    Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si/sub 1-x/Ge/sub x by Mubarek, H.A.W.E., Karunaratne, M., Bonar, J.M., Dilliway, G.D., Wang, Y., Hemment, P.L.F., Willoughby, A.F., Ashburn, P.

    Get full text
    Article
    Save to List
    Saved in:

Search Tools: