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Multi-beam mask writer exposure optimization for EUV mask stacks
by
Hudek, Peter
,
Jurkovič, Michal
,
Choleva, Pavlina
,
Wroczewski, Witold
,
Hashimoto, Masahiro
,
Ono, Kazunori
,
Fukui, Toru
,
Takahashi, Toshiya
,
Takahashi, Kotaro
Published in
Journal of micro/nanolithography, MEMS, and MOEMS
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Journal Title
Journal Of Micro/Nanolithography, Mems, And Moems
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Journal Of Micro/Nanopatterning, Materials, And Metrology
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Subjects
Chemically Amplified-Resists
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Electron Beam Lithography
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Engineering
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Engineering, Electrical & Electronic
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Extreme Ultraviolet
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Mask Blank
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Materials Science
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Materials Science, Multidisciplinary
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Multi-Beam Mask Writer
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Nanoscience & Nanotechnology
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Optics
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Physical Sciences
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