Improvement in the Device Characteristics of Tin Oxide Thin-film Transistors by Adopting Ultralow-Pressure Sputtering by Huh, Myung Soo, Yang, Bong Sop, Oh, Seungha, Won, Seok-Jun, Jeong, Jae Kyeong, Hwang, Cheol Seong, Kim, Hyeong Joon

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