Search Results - Yanovitskaja, Z. Sh

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  1. 1
    Simulation of surface relief effect on ALD process

    Simulation of surface relief effect on ALD process by Neizvestny, I.G., Shwartz, N.L., Yanovitskaja, Z. Sh, Zverev, A.V.

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  2. 2
    Influence of Schwoebel barrier and diffusion anisotropy on step density oscillation amplitude during epitaxial growth

    Influence of Schwoebel barrier and diffusion anisotropy on step density oscillation amplitude during epitaxial growth by Neizvestny, I.G., Shwartz, N.L., Yanovitskaja, Z. Sh

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  3. 3
    Schwoebel barriers and quantum dot lateral size equalization during epitaxial growth

    Schwoebel barriers and quantum dot lateral size equalization during epitaxial growth by Brunev, D V, Neizvestny, I G, Shwartz, N L, Yanovitskaja, Z Sh

    Published in Nanotechnology
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  4. 4
    Monte Carlo simulation of steps behavior on Si(111) surface during sublimation

    Monte Carlo simulation of steps behavior on Si(111) surface during sublimation by Neizvestny, I.G, Shwartz, N.L, Yanovitskaja, Z.Sh, Zverev, A.V

    Published in Thin solid films
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  5. 5
    The effects of monovacancies on the terrace width during sublimation from the (111) surface of a diamond-like crystal

    The effects of monovacancies on the terrace width during sublimation from the (111) surface of a diamond-like crystal by Zverev, A. V., Neizvestny, I. G., Shvartz, N. L., Yanovitskaja, Z. Sh

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  6. 6
    Influence of schwoebel barrier and diffusion anisotropy on step density oscillation amplitude during epitaxial growth

    Influence of schwoebel barrier and diffusion anisotropy on step density oscillation amplitude during epitaxial growth by NEIZVESTNY, I. G, SHWARTZ, N. L, YANOVITSKAJA, Z. Sh

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  7. 7
    Simulation of surface relief effect on ALD process

    Simulation of surface relief effect on ALD process by NEIZVESTNY, I. G, SHWARTZ, N. L, YANOVITSKAJA, Z. Sh, ZVEREV, A. V

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  8. 8
    Simulation of Porous Layer Sintering During High-Temperature Annealing

    Simulation of Porous Layer Sintering During High-Temperature Annealing by Govorukha, T.B., Shwartz, N.L., Yanovitskaja, Z.sh, Zverev, A.V.

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  9. 9
    Schwoebel barriers and quantum dot lateral size equalization during epitaxial growth

    Schwoebel barriers and quantum dot lateral size equalization during epitaxial growth by BRUNEV, D. V, NEIZVESTNY, I. G, SHWARTZ, N. L, YANOVITSKAJA, Z. Sh

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  10. 10
    Monte Carlo simulation of steps behavior on Si(111) surface during sublimation

    Monte Carlo simulation of steps behavior on Si(111) surface during sublimation by NEIZVESTNY, I. G, SHWARTZ, N. L, YANOVITSKAJA, Z. Sh, ZVEREV, A. V

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  11. 11
    Evolution of porous surfaces Si[111] and Si[100] during annealing and epitaxy processes (simulation)

    Evolution of porous surfaces Si[111] and Si[100] during annealing and epitaxy processes (simulation) by Chemakin, A.V., Shwartz, N.L., Yanovitskaja, Z.S., Zverev, A.V.

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  12. 12
    Simulation of trench filling process

    Simulation of trench filling process by Gutova, Neizvestny, Shwartz, Yanovitskaja, Zverev

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  13. 13
    Examination of dimer formation on Si(001) by Monte Carlo simulation

    Examination of dimer formation on Si(001) by Monte Carlo simulation by Nastovjak, A.G., Romanyuk, K.N., Shwartz, N.L., Yanovitskaja, Z.S., Zinchenko, K.Yu, Zverev, A.V.

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