Application of N2/Ar inductively coupled plasma to the photoresist ashing for low-k dielectrics by HYOUN WOO KIM, JU HYUN MYUNG, PARK, Se-Geun, LEE, Jae-Gab, NAM HO KIM, YOO, Chung-Gon, KEE WON SUH, SUNG KYEONG KIM, CHOI, Dae-Kyu, CHUNG, Chin-Wook, KANG, Chang-Jin, WAN JAE PARK

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Photoresist ashing in nitrogen gas using ferrite core inductively coupled plasmas by Kim, Hyoun Woo, Myung, Ju Hyun, Kim, Nam Ho, Chung, Chin Wook, Park, Wan Jae, Kang, Chang-Jin, Yoo, Chung-Gon, Choi, Dae-Kyu

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Etching characteristics of photoresist and low-k dielectrics by Ar/O2 ferrite-core inductively coupled plasmas by HYOUN WOO KIM, JONG WOO LEE, JOO, Junghoon, CHIN WOOK CHUNG, WAN JAE PARK, KANG, Chang-Jin, JOO, Sukho, SOON OH PARK, YOO, Chung-Gon, SUNG KYEONG KIM, JOUNG HO LEE, CHO, Sang-Deog, WOON SUK HWANG, CHOI, Dae-Kyu, KIM, Keeho, JANG, Jeong-Yeol, BEOM HOAN O, SEUNG GOL LEE, PARK, Se-Geun, KIM, Joohee, DUCK JIN CHUNG, SUNG PIL CHANG, JOO, Young-Chang

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Study of ashing for low-k dielectrics using the N 2/O 2 ferrite-core inductively coupled plasmas by Kim, Hyoun Woo, Myung, Ju Hyun, Kim, Nam Ho, Lee, Han Sup, Park, Se-Geun, Lee, Jae Gab, Chung, Chin Wook, Park, Wan Jae, Kang, Chang-Jin, Yoo, Chung-Gon, Ko, Kwang-Hyuk, Woo, Je-Ho, Choi, Sang-Don, Choi, Dae-Kyu

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Etching characteristics of photoresist and low- k dielectrics by Ar/O 2 ferrite-core inductively coupled plasmas by Kim, Hyoun Woo, Lee, Jong Woo, Hwang, Woon Suk, O, Beom Hoan, Lee, Seung Gol, Park, Se-Geun, Kim, Joohee, Chung, Duck Jin, Chang, Sung Pil, Joo, Young-Chang, Joo, Junghoon, Chung, Chin Wook, Park, Wan Jae, Kang, Chang-Jin, Joo, Sukho, Park, Soon Oh, Yoo, Chung-Gon, Kim, Sung Kyeong, Lee, Joung Ho, Cho, Sang-Deog, Choi, Dae-Kyu, Kim, Keeho, Jang, Jeong-Yeol

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Study of ashing for low-k dielectrics using the N2/O2 ferrite-core inductively coupled plasmas by Kim, H W, Myung, J H, Kim, N H, Lee, H S, Park, S G, Lee, J G, Chung, C W, Park, W J, Kang, C J, Yoo, C G, Ko, K H, Woo, J H, Choi, S D, Choi, D K

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Study of ashing for low-k dielectrics using the N2/O2 ferrite-core inductively coupled plasmas by HYOUN WOO KIM, JU HYUN MYUNG, KO, Kwang-Hyuk, WOO, Je-Ho, CHOI, Sang-Don, CHOI, Dae-Kyu, NAM HO KIM, HAN SUP LEE, SE-GEUN PARK, JAE GAB LEE, CHIN WOOK CHUNG, WAN JAE PARK, CHANG-JIN KANG, YOO, Chung-Gon

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Effect of Octenylsuccinylation on Rheological Properties of Corn Starch Pastes by Park, Sunae, Chung, Man-Gon, Yoo, Byoungseung

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A new phenanthrene derivative and two diarylheptanoids from the roots of Brassica rapa ssp. campestris inhibit the growth of cancer cell lines and LDL-oxidation by Wu, Qian, Cho, Jin-Gyeong, Yoo, Ki-Hyun, Jeong, Tae-Sook, Park, Ji-Hae, Kim, Su-Yeon, Kang, Ji-Hyun, Chung, In-Sik, Choi, Myung-Sook, Lee, Kyung-Tae, Chung, Hae-Gon, Bang, Myun-Ho, Baek, Nam-In

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