Search Results - Yoshitake, Shusuke

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  1. 1
    Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight

    Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight by Konda, Akihiro, Yamamoto, Hiroki, Yoshitake, Shusuke, Kozawa, Takahiro

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  2. 2
    Theoretical study on relationship between exposure pattern width and chemical gradient of 16 nm half-pitch line-and-space patterns in electron beam lithography used for photomask and nanoimprint mold production

    Theoretical study on relationship between exposure pattern width and chemical gradient of 16 nm half-pitch line-and-space patterns in electron beam lithography used for photomask a... by Kozawa, Takahiro, Yoshitake, Shusuke

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  3. 3
    Transient Swelling During Development of Poly(methyl methacrylate) Resist

    Transient Swelling During Development of Poly(methyl methacrylate) Resist by Konda, Akihiro, Yamamoto, Hiroki, Yoshitake, Shusuke, Kozawa, Takahiro

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  4. 4
    Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication

    Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication by Akeno, Kiminobu, Ogasawara, Munehiro, Ooki, Kenji, Tojo, Toru, Hirano, Ryoichi, Yoshitake, Shusuke, Toriumi, Masaki, Sekine, Akihiko, Takigawa, Tadahiko, Shinoda, Toshiki, Noguchi, Shigeru

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  5. 5
    Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system

    Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system by Ogasawara, Munehiro, Shimomura, Naoharu, Takamatsu, Jun, Yoshitake, Shusuke, Ooki, Kenji, Nakayamada, Noriaki, Okabe, Humiyuki, Tojo, Toru, Takigawa, Tadahiro

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