Search Results - Yost, D.R.W.

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  1. 1
    Scaling Three-Dimensional SOI Integrated-Circuit Technology

    Scaling Three-Dimensional SOI Integrated-Circuit Technology by Chen, C.K., Warner, K., Yost, D.R.W., Knecht, J.M., Suntharalingam, V., Chen, C.L., Burns, J.A., Keast, C.L.

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  2. 2
    Characterization of a three-dimensional SOI integrated-circuit technology

    Characterization of a three-dimensional SOI integrated-circuit technology by Chen, C.K., Checka, N., Tyrrell, B.M., Chen, C.L., Wyatt, P.W., Yost, D.R.W., Knecht, J.M., Kedzierski, J.T., Keast, C.L.

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    3D via etch development for 3D circuit integration in FDSOI

    3D via etch development for 3D circuit integration in FDSOI by Knecht, J.M., Yost, D.R.W., Burns, J.A., Chen, C.K., Keast, C.L., Warner, K.

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    Elimination of parasitic channels in fully depleted SOI CMOS

    Elimination of parasitic channels in fully depleted SOI CMOS by Chen, C.K., Chen, C.L., Wyatt, P.W., Gouker, P., Burns, J.A., Yost, D.R.W., Suntharalingam, V., Keast, C.L.

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