Search Results - Yukimori, Daiki

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  1. 1
    In Situ Generation of Silylzinc by Si−B Bond Activation Enabling Silylzincation and Silaboration of Terminal Alkynes

    In Situ Generation of Silylzinc by Si−B Bond Activation Enabling Silylzincation and Silaboration of Terminal Alkynes by Nagashima, Yuki, Yukimori, Daiki, Wang, Chao, Uchiyama, Masanobu

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  2. 2
    Dearomative triple elementalization of quinolines driven by visible light

    Dearomative triple elementalization of quinolines driven by visible light by Ishigaki, Shiho, Nagashima, Yuki, Yukimori, Daiki, Tanaka, Jin, Matsumoto, Takashi, Miyamoto, Kazunori, Uchiyama, Masanobu, Tanaka, Ken

    Published in Nature communications
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  3. 3
    In Situ Generation of Silylzinc by Si−B Bond Activation Enabling Silylzincation and Silaboration of Terminal Alkynes

    In Situ Generation of Silylzinc by Si−B Bond Activation Enabling Silylzincation and Silaboration of Terminal Alkynes by Nagashima, Yuki, Yukimori, Daiki, Wang, Chao, Uchiyama, Masanobu

    Published in Angewandte Chemie
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  4. 4
    Quadruple Borylation of Terminal Alkynes

    Quadruple Borylation of Terminal Alkynes by Yukimori, Daiki, Nagashima, Yuki, Wang, Chao, Muranaka, Atsuya, Uchiyama, Masanobu

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  5. 5
    Swelling Analysis of Negative-tone Photosensitive Dielectric Materials for Fine Pitch Redistribution Layers

    Swelling Analysis of Negative-tone Photosensitive Dielectric Materials for Fine Pitch Redistribution Layers by Yukimori, Daiki, Inoue, Go, Ishikawa, Nobuhiro, Sekiguchi, Atsushi, Ogata, Toshiyuki

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  6. 6
    Study of i-Line Photosensitive Materials with a Wide Depth of Focus for Fine Pitch Redistribution Layers

    Study of i-Line Photosensitive Materials with a Wide Depth of Focus for Fine Pitch Redistribution Layers by Yukimori, Daiki, Kunito, Mei, Ishikawa, Nobuhiro, Sekiguchi, Atsushi, Ogata, Toshiyuki

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  7. 7
    Lithographic Performance and Insulation Reliability of a Novel i-Line Photosensitive Dielectric Material

    Lithographic Performance and Insulation Reliability of a Novel i-Line Photosensitive Dielectric Material by Inoue, Go, Yukimori, Daiki, Shibasaki, Kaho, Okuda, Ayano, Ishikawa, Nobuhiro, Han, Young-Gun, Kanayama, Taka, Suetsugu, Tadashi, Ogata, Toshiyuki

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