Search Results - Yusup, Luchana L

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  1. 1
    Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor

    Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor by Park, Jae-Min, Jang, Se Jin, Yusup, Luchana L, Lee, Won-Jun, Lee, Sang-Ick

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  2. 2
    Catalyzed Atomic Layer Deposition of Silicon Oxide at Ultralow Temperature Using Alkylamine

    Catalyzed Atomic Layer Deposition of Silicon Oxide at Ultralow Temperature Using Alkylamine by Mayangsari, Tirta R, Park, Jae-Min, Yusup, Luchana L, Gu, Jiyeon, Yoo, Jin-Hyuk, Kim, Heon-Do, Lee, Won-Jun

    Published in Langmuir
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  3. 3
    Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride

    Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride by Yusup, Luchana L, Park, Jae-Min, Noh, Yong-Ho, Kim, Sun-Jae, Lee, Won-Jun, Park, Sora, Kwon, Young-Kyun

    Published in RSC advances
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  4. 4
    Study of surface reaction during selective epitaxy growth of silicon by thermodynamic analysis and density functional theory calculation

    Study of surface reaction during selective epitaxy growth of silicon by thermodynamic analysis and density functional theory calculation by Mayangsari, Tirta R., Yusup, Luchana L., Park, Jae-Min, Blanquet, Elisabeth, Pons, Michel, Jung, Jongwan, Lee, Won-Jun

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  5. 5
    Surface reaction of silicon chlorides during atomic layer deposition of silicon nitride

    Surface reaction of silicon chlorides during atomic layer deposition of silicon nitride by Yusup, Luchana L., Park, Jae-Min, Mayangsari, Tirta R., Kwon, Young-Kyun, Lee, Won-Jun

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