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    Effects of rapid thermal annealing on interfacial and electrical properties of Gd-doped HfO2 high-k gate dielectrics

    Effects of rapid thermal annealing on interfacial and electrical properties of Gd-doped HfO2 high-k gate dielectrics by Ma, Rui, Liu, Mao, He, Gang, Fang, Ming, Shang, Guoliang, Zhang, Jiweng, Chen, Xuefei, Gao, Juan, Fei, Guangtao, Zhang, Lide

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