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    High deposition rate nanocrystalline and amorphous silicon thin film production via surface wave plasma source

    High deposition rate nanocrystalline and amorphous silicon thin film production via surface wave plasma source by Peck, Jason A., Zonooz, Piyum, Curreli, Davide, Panici, Gianluca A., Jurczyk, Brian E., Ruzic, David N.

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